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- Dictionaryphotomask/ˈfəʊtə(ʊ)mɑːsk/
noun
- 1. a photographic pattern used in making microcircuits, ultraviolet light being shone through the mask on to a photoresist in order to transfer the pattern.
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A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon).
Simply put, a photomask is an image-transferring tool. Photomasks are comprised of a solid, transparent substrate, such as glass or fused silica, showing an opaque coating on one of the surfaces where a microscopic pattern has been etched, leaving some regions transparent and others opaque.
Dec 13, 2022 · A photomask is basically a “master template” of an IC design. A mask comes in different sizes. A common size is 6- x 6-inch. A basic and simple mask consists of a quartz or glass substrate. The photomask is coated with an opaque film. More complex masks use other materials.
A photomask consists of a fused silica (QZ) or, glass (SL) substrate coated with an opaque film, in to which an accurate replication of the device designer’s pattern is etched.
pho· to· mask ˈfō-tō-ˌmask. plural photomasks. : a pattern of opaque material used to shield selected areas of a surface (as of a semiconductor) in deposition or etching (as in producing an integrated circuit) : mask sense 3d.
Nov 18, 2022 · A photomask, also known simply as a mask or reticle, is a key component in the photolithography process used in semiconductor manufacturing and other areas of microfabrication. It is a high-precision plate or glass substrate that carries a pattern of opaque and transparent regions.
A photomask is an opaque plate or film with transparent areas that allow light to shine through in a defined pattern. They are commonly used in photolithography processes but are also used in many other applications by a wide range of industries and technologies.
Jan 29, 2024 · A mask is a pattern transferring device, a glass or fused silica/quartz plate with opaque and transparent patterns on its surface. A mask works much like a negative - by shining light through the mask, the detailed device image can then be projected onto the wafer (see photoresist).
Photomasks used for optical lithography contain the pattern of the integrated circuits. The basis is a so called blank: a glass substrate which is coated with a chrome and a resist layer. The resist is sensitive to electron beams and can be transferred into the chrome layer via etch processes.
A photomask is a fused silica (quartz) plate, typically 6 inches (~152mm) square, covered with a pattern of opaque, transparent, and phase-shifting areas that are projected onto wafers in the lithography process to define the layout of one layer of an integrated circuit.
