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- Dictionaryphotomask/ˈfəʊtə(ʊ)mɑːsk/
noun
- 1. a photographic pattern used in making microcircuits, ultraviolet light being shone through the mask on to a photoresist in order to transfer the pattern.
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A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon).
Simply put, a photomask is an image-transferring tool. Photomasks are comprised of a solid, transparent substrate, such as glass or fused silica, showing an opaque coating on one of the surfaces where a microscopic pattern has been etched, leaving some regions transparent and others opaque.
Dec 13, 2022 · A photomask is basically a “master template” of an IC design. A mask comes in different sizes. A common size is 6- x 6-inch. A basic and simple mask consists of a quartz or glass substrate. The photomask is coated with an opaque film. More complex masks use other materials.
: a pattern of opaque material used to shield selected areas of a surface (as of a semiconductor) in deposition or etching (as in producing an integrated circuit) : mask sense 3d. Examples of photomask in a Sentence.
- Overview
- Terminology
- Manufacturing Process
- Reticle Limit
A mask is a pattern transferring device, a glass or fused silica/quartz plate with opaque and transparent patterns on its surface. A mask works much like a negative - by shining light through the mask, the detailed device image can then be projected onto the wafer (see photoresist). The transmitted image is often passed through some sort of lens ca...
Historically, a mask or photomask referred to a pattern transferring device that contained the entire pattern of a single layer of a full wafer. A reticle, on the other hand, referred to a single layer of pattern that covers a small portion of the wafer. A reticle has to be stepped and repeated in order to expose the entire wafer. In other words, c...
Masks are made using a photomask blank. The mask blanks are made from a finely polished quartz glass which acts as the glass substrate and Chromium atoms which are deposited on top of it to create a light-shielding layer. A coat of photosensitive resinis then used to cover the surface of the mask blank. Using electron beams a circuit pattern is the...
Current i193 and EUV lithography steppers have a maximum field size of 26 mm by 33 mm or 858 mm². In future High-NA EUVlithography steppers the reticle limit will be halved to 26 mm by 16,5 mm or 429 mm² due to the use of an amorphous lens array.
A photomask consists of a fused silica (QZ) or, glass (SL) substrate coated with an opaque film, in to which an accurate replication of the device designer’s pattern is etched.
Nov 18, 2022 · A photomask, also known simply as a mask or reticle, is a key component in the photolithography process used in semiconductor manufacturing and other areas of microfabrication. It is a high-precision plate or glass substrate that carries a pattern of opaque and transparent regions.
