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- Dictionaryphotomask/ˈfəʊtə(ʊ)mɑːsk/
noun
- 1. a photographic pattern used in making microcircuits, ultraviolet light being shone through the mask on to a photoresist in order to transfer the pattern.
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A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon).
Simply put, a photomask is an image-transferring tool. Photomasks are comprised of a solid, transparent substrate, such as glass or fused silica, showing an opaque coating on one of the surfaces where a microscopic pattern has been etched, leaving some regions transparent and others opaque.
Dec 13, 2022 · A photomask is basically a “master template” of an IC design. A mask comes in different sizes. A common size is 6- x 6-inch. A basic and simple mask consists of a quartz or glass substrate. The photomask is coated with an opaque film. More complex masks use other materials.
A photomask consists of a fused silica (QZ) or, glass (SL) substrate coated with an opaque film, in to which an accurate replication of the device designer’s pattern is etched.
Jan 29, 2024 · A mask is a pattern transferring device, a glass or fused silica/quartz plate with opaque and transparent patterns on its surface. A mask works much like a negative - by shining light through the mask, the detailed device image can then be projected onto the wafer (see photoresist).
Nov 18, 2022 · A photomask, also known simply as a mask or reticle, is a key component in the photolithography process used in semiconductor manufacturing and other areas of microfabrication. It is a high-precision plate or glass substrate that carries a pattern of opaque and transparent regions.
Photomasks used for optical lithography contain the pattern of the integrated circuits. The basis is a so called blank: a glass substrate which is coated with a chrome and a resist layer. The resist is sensitive to electron beams and can be transferred into the chrome layer via etch processes.
